Research Areas
Professor Heui Jae Pahk, Emeritus Professor, has built a long-standing research career grounded in Precision Metrology, with a focus on advancing measurement accuracy and reliability through the development of metrological theories and systems. His early work centered on Computer-Aided Error Calibration and Engineering Metrology, where he systematically analyzed and compensated for inherent errors in measurement systems, extending the achievable limits of measurement accuracy required in precision engineering applications.
Alongside this, he conducted extensive research in Design for Precision Machine Systems, addressing system-level design and optimization by considering the interaction between metrology instruments and precision mechanical components. These efforts contributed to establishing fundamental design principles for hardware structures as well as actuation and control elements essential to precision measurement systems.
His research subsequently expanded to Ultra-Precision Optical Metrology, with a particular emphasis on high-resolution measurement of three-dimensional surface profiles and thin-film thicknesses. Through the development of optical measurement techniques based on interferometry, reflectometry, and ellipsometry, his work has contributed to the development and industrial deployment of precision form and thickness metrology technologies in practical manufacturing and inspection environments.
More recently, Professor Park has extended his research activities to optical inspection of semiconductor and display devices, as well as precision optical inspection and vision-based image processing. By integrating optical metrology with advanced image processing techniques, his research has addressed the growing demands of highly miniaturized and densely integrated semiconductor and display devices, contributing to improved measurement accuracy and inspection efficiency in industrial settings.